Počet záznamů: 1
Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
- 1.Lundin, D., Čada, M., Hubička, Z. Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS. Plasma Sources Science & Technology. 2015, 24(3), 035018. ISSN 0963-0252. E-ISSN 1361-6595. Dostupné z: doi: 10.1088/0963-0252/24/3/035018
Počet záznamů: 1