Počet záznamů: 1
Effect of nitrogen doping on TiO.sub.x./sub.N.sub.y./sub. thin film formation at reactive high-power pulsed magnetron sputtering
- 1.Straňák, V., Quaas, M., Bogdanowicz, R., Steffen, H., Wulff, H., Hubička, Z., Tichý, M., Hippler, R. Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering. Journal of Physics D-Applied Physics. 2010, 43(28), 1-7. ISSN 0022-3727. E-ISSN 1361-6463. Dostupné z: doi: 10.1088/0022-3727/43/28/285203.
Počet záznamů: 1