Počet záznamů: 1
Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses
- 1.Mocek, T., Jakubczak, K., Kozlová, M., Polan, J., Homer, P., Hřebíček, J., Sawicka, M., Kim, I. J., Park, S.B., Kim, C. M., Lee, G.H., Kim, T.K., Nam, C. H., Chalupský, J., Hájková, V., Juha, L., Sobota, J., Fořt, T., Rus, B. Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses. Radiation Effects and Defects in Solids. 2010, 165(6-10), 551-558. ISSN 1042-0150. E-ISSN 1029-4953. Dostupné z: doi: 10.1080/10420151003722867
Počet záznamů: 1