Počet záznamů: 1
LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition
- 1.Stuchlík, J., Ledinský, M., Honda, S., Drbohlav, I., Mates, T., Fejfar, A., Hruška, K., Stuchlíková, T.-H., Kočka, J. LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition. Thin Solid Films. 2009, 517(24), 6829-6832. ISSN 0040-6090. E-ISSN 1879-2731. Dostupné z: doi: 10.1016/j.tsf.2009.05.022
Počet záznamů: 1