Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO.sub.2./sub. layers

HIPPLER, R., HUBIČKA, Z., ČADA, M., KŠÍROVÁ, P., WULFF, H., HELM, C.A., STRAŇÁK, V. Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO₂ layers. Journal of Applied Physics. 2017, 121(17), 1-9), 171906. ISSN 0021-8979. E-ISSN 1089-7550. Dostupné z: doi: 10.1063/1.4977823