Deposition of hematite Fe.sub.2./sub.O.sub.3./sub. thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

HUBIČKA, Z., KMENT, Š., OLEJNÍČEK, J., ČADA, M., KUBART, T., BRUNCLÍKOVÁ, M., KŠÍROVÁ, P., ADÁMEK, P., REMEŠ, Z. Deposition of hematite Fe₂O₃ thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system. Thin Solid Films. 2013, 549(Dec), 184-191. ISSN 0040-6090. E-ISSN 1879-2731. Dostupné z: doi: 10.1016/j.tsf.2013.09.031