LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition

STUCHLÍK, J., LEDINSKÝ, M., HONDA, S., DRBOHLAV, I., MATES, T., FEJFAR, A., HRUŠKA, K., STUCHLÍKOVÁ, T.-H., KOČKA, J. LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition. Thin Solid Films. 2009, 517(24), 6829-6832. ISSN 0040-6090. E-ISSN 1879-2731. Dostupné z: doi: 10.1016/j.tsf.2009.05.022