Počet záznamů: 1
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO.sub.2./sub. layers
- 1.HIPPLER, R., HUBIČKA, Zdeněk, ČADA, Martin, KŠÍROVÁ, Petra, WULFF, H., HELM, C.A., STRAŇÁK, V. Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers. Journal of Applied Physics. 2017, 121(17), 1-9), 171906. ISSN 0021-8979. E-ISSN 1089-7550. Dostupné z: doi: 10.1063/1.4977823
Počet záznamů: 1