Počet záznamů: 1
The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition
- 1.ČERVENKA, Jiří, LEDINSKÝ, Martin, STUCHLÍK, Jiří, STUCHLÍKOVÁ, The-Ha, BAKARDJIEVA, Snejana, HRUŠKA, Karel, FEJFAR, Antonín, KOČKA, Jan. The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition. Nanotechnology. 2010, 21(41), 415604/1-415604/7. ISSN 0957-4484. E-ISSN 1361-6528. Dostupné z: doi: 10.1088/0957-4484/21/41/415604
Počet záznamů: 1