Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses

MOCEK, Tomáš, JAKUBCZAK, Krzysztof, KOZLOVÁ, Michaela, POLAN, Jiří, HOMER, Pavel, HŘEBÍČEK, J., SAWICKA, Magdalena, KIM, I. J., PARK, S.B., KIM, C. M., LEE, G.H., KIM, T.K., NAM, C. H., CHALUPSKÝ, Jaromír, HÁJKOVÁ, Věra, JUHA, Libor, SOBOTA, Jaroslav, FOŘT, Tomáš, RUS, Bedřich. Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses. Radiation Effects and Defects in Solids. 2010, 165(6-10), 551-558. ISSN 1042-0150. E-ISSN 1029-4953. Dostupné z: doi: 10.1080/10420151003722867