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Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument
- 1.SEONG, B. S., EM, V., MIKULA, Pavol, ŠAROUN, Jan, KANG, M.H. Optimization of a bent perfect Si(111) monochromator at a small take-off angle for use in a stress instrument. Journal of Applied Crystallography. 2010, 43(3), 654-658. ISSN 0021-8898. E-ISSN 1600-5767. Dostupné z: doi: 10.1107/S0021889810008551
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