Soft x-ray free electron laser microfocus for exploring matter under extreme conditions

NELSON, A.J., TOLEIKIS, S., CHAPMAN, H., BAJT, S., KRZYWINSKI, J., CHALUPSKÝ, Jaromír, JUHA, Libor, CIHELKA, Jaroslav, HÁJKOVÁ, Věra, VYŠÍN, Luděk, BURIAN, T., KOZLOVÁ, Michaela, FÄUSTLIN, R.R., NAGLER, B., VINKO, S.M., WHITCHER, T., DZELZAINIS, T., RENNER, Oldřich, SAKSL, K., KHORSAND, A.R., HEIMANN, P.A., SOBIERAJSKI, R., KLINGER, D., JUREK, M., PELKA, J., IWAN, B., ANDREASSON, J., TIMNEANU, N., FAJARDO, M., WARK, J. S., RILEY, D., TSCHENTSCHER, T., HAJDU, J., LEE, R. W. Soft x-ray free electron laser microfocus for exploring matter under extreme conditions. Optics Express. 2009, 17(20), 18271-18278. ISSN 1094-4087. Dostupné z: doi: 10.1364/OE.17.018271