Počet záznamů: 1
Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser
- 1.0352022 - FZÚ 2011 RIV US eng J - Článek v odborném periodiku
Hau-Riege, S.P. - London, R.A. - Graf, A. - Baker, S. L. - Soufli, R. - Sobierajski, R. - Burian, Tomáš - Chalupský, Jaromír - Juha, Libor - Gaudin, J. - Krzywinski, J. - Moeller, S. - Messerschmidt, M. - Bozek, J. - Bostedt, C.
Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser.
Optics Express. Roč. 18, č. 23 (2010), s. 23933-23938. ISSN 1094-4087
Grant CEP: GA AV ČR KAN300100702; GA MŠMT LC510; GA MŠMT(CZ) LC528; GA MŠMT LA08024; GA AV ČR IAAX00100903; GA MŠMT(CZ) ME10046; GA AV ČR IAA400100701
Výzkumný záměr: CEZ:AV0Z10100523
Klíčová slova: x-ray optics * optical materials * x-ray free electron laser
Kód oboru RIV: BH - Optika, masery a lasery
Impakt faktor: 3.749, rok: 2010
Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
Trvalý link: http://hdl.handle.net/11104/0191631
Počet záznamů: 1