Počet záznamů: 1
High deposition rate films prepared by reactive HiPIMS
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$a 10.1016/j.vacuum.2021.110329 $2 DOI 100 $a 20230126d m y slo 03 ba 101 0-
$a eng 102 $a GB 200 1-
$a High deposition rate films prepared by reactive HiPIMS 215 $a 10 s. 463 -1
$1 001 cav_un_epca*0257687 $1 011 $a 0042-207X $e 1879-2715 $1 200 1 $a Vacuum $v Roč. 191, Sep (2021) $1 210 $c Elsevier 608 $a Article 610 $a reactive magnetron sputtering 610 $a HiPIMS 610 $a Monte-carlo simulations 610 $a deposition rate 610 $a sputtering yield 700 -1
$3 cav_un_auth*0073201 $a Mareš $b P. $y CZ $q HVM Plasma, Hutmance 2, Prague 15800 5, Czech Republic, 701 -1
$3 cav_un_auth*0404807 $a Dubau $b M. $y CZ $q HVM Plasma, Hutmance 2, Prague 15800 5, Czech Republic, 701 -1
$3 cav_un_auth*0234844 $a Polášek $b J. $y CZ $q HVM Plasma, Hutmance 2, Prague 15800 5, Czech Republic, 701 -1
$3 cav_un_auth*0100379 $a Mates $b Tomáš $p FZU-D $i Tenké vrstvy a nanostruktury $j Thin Films and Nanostructures $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0398754 $a Kozák $b T. $y CZ $q Univ West Bohemia, Dept Phys, Univ 8, Plzen 30100, Czech Republic, Univ West Bohemia, NTIS European Ctr Excellence, Univ 8, Plzen 30100, Czech Republic 701 -1
$3 cav_un_auth*0084905 $a Vyskočil $b J. $y CZ $q HVM Plasma, Hutmance 2, Prague 15800 5, Czech Republic, 856 $u https://doi.org/10.1016/j.vacuum.2021.110329 $9 RIV
Počet záznamů: 1