Počet záznamů: 1
Oxidation of ablated silicon during pulsed laser deposition in a background gas with different oxygen partial pressures
SYS 0509434 LBL 01000a^^22220027750^450 005 20240711155946.4 017 $a 10.1051/epjconf/201919600008 $2 DOI 100 $a 20191014d m y slo 03 ba 101 $a eng 102 $a FR 200 1-
$a Oxidation of ablated silicon during pulsed laser deposition in a background gas with different oxygen partial pressures 215 $a 5 s. $c E 300 $a Není wos ani scopus dne 30.1.2020 463 -1
$1 001 cav_un_epca*0509435 $1 011 $a 2100-014X $1 200 1 $a EPJ Web of Conferences $h 196 $v S. 1-5 $1 210 $a les Ulis $c EDP Sciences $d 2019 $1 702 1 $a Markovich $b D.M. $4 340 $1 702 1 $4 340 $a Kuibin $b P.A. $1 702 1 $4 340 $a Vorobyev $b M.A. 610 $a SiOx films 610 $a pulsed laser deposition (PLD) 610 $a silicon ablation 700 -1
$3 cav_un_auth*0314165 $a Starinskiy $b S.V. $y RU 701 -1
$3 cav_un_auth*0276736 $a Rodionov $b A.A. $y RU 701 -1
$3 cav_un_auth*0314166 $a Shukhov $b Y.G. $y RU 701 -1
$3 cav_un_auth*0363377 $a Bulgakov $b Alexander V. $p FZU-D $i Centrum HiLASE $j HiLASE Centre $w Development of Lasers and Advanced Technologies (HiLASE) $y RU $T Fyzikální ústav AV ČR, v. v. i. 856 $u https://www.epj-conferences.org/.../epjconf_avtfg18_00008.html
Počet záznamů: 1