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Reaction of PFCs in water stabilized plasma
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SYSNO ASEP 0487183 Druh ASEP A - Abstrakt Zařazení RIV Záznam nebyl označen do RIV Zařazení RIV Není vybrán druh dokumentu Název Reaction of PFCs in water stabilized plasma Tvůrce(i) Mastný, L. (CZ)
Horníček, J. (CZ)
Živný, Oldřich (UFP-V) RID
Brožek, Vlastimil (UFP-V) RID
Sember, Viktor (UFP-V) RIDZdroj.dok. ChemZi - ISSN 1336-7242
Roč. 13, č. 1 (2017), s. 161Poč.str. 1 s. Forma vydání Tištěná - P Akce Zjazd chemikov /69./ Datum konání 11.09.2017 - 15.09.2017 Místo konání Horný Smokovec Země SK - Slovensko Typ akce EUR Jazyk dok. eng - angličtina Země vyd. SK - Slovensko Klíč. slova Water stabilized plasma ; tetrafluoromethane ; corrosion resistance ; boron nitride ; titanium nitride Vědní obor RIV BL - Fyzika plazmatu a výboje v plynech Obor OECD Fluids and plasma physics (including surface physics) CEP GC17-10246J GA ČR - Grantová agentura ČR Institucionální podpora UFP-V - RVO:61389021 Anotace In order to investigate plasma abatement of highly stable fluoro- and chlorocarbons using steam plasma generated by water stabilized DC-plasma torch equilibrium composition and thermodynamic properties of the system formed by decomposition products were calculated. The first step of the joined bilateral project solved by Institute of plasma Physics of the CAS and NTU and INER at Taiwan is the investigation of the processes CF4 + 2 H2O = CO2 + 4 HF, which efficient at temperatures above 4000 %C. For such the reaction course the modification of the plasma chemical reactor are required in order to be sufficiently resistant to the produced hydrogenfluoride. Therefore, corrosion resistance of the materials made from boron nitride and titanium nitride was investigated. Both the materials are mechanically and chemically stable up to 3000 °°C. These materials were selected because of the plasma generator itself produces nitrogen oxides which, after reaction with water, give rise to acid environment to which these materials exhibit high corrosion resistance. The samples of BN and TiN has been prepared by Spark plasma sintering method. The reactivity of the TiN samples was compared to the corresponding thin films prepared by magnetron sputtering method Pracoviště Ústav fyziky plazmatu Kontakt Vladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975 Rok sběru 2018
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