WO.sub.3./sub. thin films prepared by sedimentation and plasma sputtering

0474060 - FZÚ 2018 RIV NL eng J - Článek v odborném periodiku
Olejníček, Jiří - Brunclíková, Michaela - Kment, Š. - Hubička, Zdeněk - Kmentová, N. - Kšírová, Petra - Čada, Martin - Zlámal, M. - Krýsa, J.
WO₃ thin films prepared by sedimentation and plasma sputtering.
Chemical Engineering Journal. Roč. 318, Jun (2017), s. 281-288. ISSN 1385-8947. E-ISSN 1873-3212
Grant CEP: GA TA ČR(CZ) TF01000084; GA ČR(CZ) GA15-00863S; GA TA ČR TA03010743; GA ČR GAP108/12/2104
Institucionální podpora: RVO:68378271
Klíčová slova: WO₃ * thin films * water splitting * pulsed magnetron sputtering * sedimentation * photo-electro-chemistry
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 6.735, rok: 2017
Trvalý link: http://hdl.handle.net/11104/0271156