Počet záznamů: 1
Characterization of organosilicon thin films prepared in atmospheric pressure Towsend-like discharge
- 1.0367693 - ÚJF 2012 GB eng A - Abstrakt
Trunec, D. - Zajíčková, L. - Buršíková, V. - Peřina, Vratislav - Studnička, F. - Sťahel, P. - Prysiazhnyi, V. - Mikšová, Romana
Characterization of organosilicon thin films prepared in atmospheric pressure Towsend-like discharge.
[Characterization of organosilicon thin films prepared in atmospheric pressure Towsend-like discharge.]
Abstract book, 19th International conference on Ion beam analysis. Cambridge: IOP, Institute of physics, 2009.
[19th International conference on Ion beam analysis. 07.09.2009-11.09.2009, Cambridge]
Výzkumný záměr: CEZ:AV0Z10480505
Klíčová slova: dieletric barrier discharges * ERDA * FTIR spectroscopy * XPS
Kód oboru RIV: BG - Jaderná, atomová a mol. fyzika, urychlovače
Trvalý link: http://hdl.handle.net/11104/0202277
Počet záznamů: 1