Počet záznamů: 1
Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds
- 1.0185122 - UJF-V 20000293 RIV GB eng J - Journal Article
Zajíčková, L. - Janča, J. - Peřina, Vratislav
Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds.
Thin Solid Films. Roč. 338, - (1999), s. 49-59. ISSN 0040-6090. E-ISSN 1879-2731
Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders
Impact factor: 1.101, year: 1999
Permanent Link: http://hdl.handle.net/11104/0081539
Počet záznamů: 1