Počet záznamů: 1
Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds
SYS 0185122 LBL 00000nam^^22^^^^^^^^450 005 20240103180102.4 101 0-
$a eng $d eng 102 $a GB 200 1-
$a Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds 215 $a 11 s. 463 -1
$1 001 cav_un_epca*0257662 $1 011 $a 0040-6090 $e 1879-2731 $1 200 1 $a Thin Solid Films $v Roč. 338, - (1999), s. 49-59 $1 210 $c Elsevier 700 -1
$3 cav_un_auth*0020799 $a Zajíčková $b L. $y CZ $4 070 701 -1
$3 cav_un_auth*0015013 $a Janča $b J. $y CZ $4 070 701 -1
$3 cav_un_auth*0100985 $a Peřina $b Vratislav $p UJF-V $w Research with Beams of Ions and Neutrons $4 070 $T Ústav jaderné fyziky AV ČR, v. v. i.
Počet záznamů: 1