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Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds
- 1.ZAJÍČKOVÁ, L., JANČA, J., PEŘINA, Vratislav. Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds. Thin Solid Films. 1999, 338(-), 49-59. ISSN 0040-6090. E-ISSN 1879-2731.
Počet záznamů: 1