0181196 - UFCH-W 20010111 RIV NL eng J - Článek v odborném periodiku
Lykhach, Y. - Sotiropoulou, D. - Thiam, Michel Malick - Pešička, J. - Nehasil, V.
EELS Study of Rh Particle Growth on ZrO₂ Substrate with Different Deposition Conditions.
Surface Science. 482-485, - (2001), s. 789-796. ISSN 0039-6028. E-ISSN 1879-2758
Grant CEP: GA ČR GA202/99/1714; GA MŠMT VS97116
Výzkumný záměr: CEZ:AV0Z4040901
Klíčová slova: rhodium * zirconium * auger electron spectroscopy
Kód oboru RIV: CF - Fyzikální chemie a teoretická chemie
Impakt faktor: 2.189, rok: 2001

EELS and AES have been used to monitor the formation of Rh films on ZrO2(100) single crystalline substrates. Rhodium was evaporated step by at various substrate temperatures. The surface morphology of the deposited material influence EELS spectra, so that the relative metal coverage of the substrate can be calculed. The EELS and AES results were compared and the conclusions concerning the deposit morphology were verified by means of transmission electron microscopy.
Trvalý link: http://hdl.handle.net/11104/0077782