Počet záznamů: 1
Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films
- 1.Mišina, Martin
Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films.
Surface and Coatings Technology. 169-170, - (2003), s. 53-56. ISSN 0257-8972. E-ISSN 1879-3347.
[Frontiers of Surface Engineering. Nagoya, 28.10.2001-31.10.2001]
Grant CEP: GA MŠMT ME 455; GA ČR GA106/99/D086
Impakt faktor: 1.410, rok: 2003
http://hdl.handle.net/11104/0032184
Počet záznamů: 1