Rezek, Bohuslav - Nebel, C. E. - Stutzmann, M.
Polycrystalline silicon thin films produced by interference laser crystallization of amorphous silicon.
Japanese Journal of Applied Physics. Roč. 38, - (1999), s. 1083-1084. ISSN 0021-4922. E-ISSN 1347-4065
Grant CEP: GA ČR GA202/98/0669; GA AV ČR IAA1010809
Grant ostatní: BMBF(DE) BEC0329814
Impakt faktor: 1.411, rok: 1999
http://hdl.handle.net/11104/0030418