Franclová, J. - Kučerová, V. - Burčíková, V. - Zajíčková, L. - Peřina, Vratislav
Structural changes of plasma deposited SiOxCyHz thin films attained by thermal annealing.
Czechoslovak Journal of Physics. Roč. 54, č. 9 (2004), C847-852. ISSN 0011-4626.
[Proceedings of the Symposium on Plasma and Technology /21./. Praha, 14.06.2004-17.06.2004]
Grant CEP: GA AV ČR KSK1010104
Impakt faktor: 0.292, rok: 2004
http://hdl.handle.net/11104/0000169