Electron attachment to hexafluoropropylene oxide (HFPO)

0497402 - ÚFCH JH 2019 RIV US eng J - Článek v odborném periodiku
Zawadski, Mateusz Ernest - Chacherau, A. - Kočišek, Jaroslav - Franck, C. M. - Fedor, Juraj
Electron attachment to hexafluoropropylene oxide (HFPO).
Journal of Chemical Physics. Roč. 149, č. 20 (2018), č. článku 204305. ISSN 0021-9606. E-ISSN 1089-7690
Grant CEP: GA ČR GA17-04844S
Institucionální podpora: RVO:61388955
Klíčová slova: electron attachment * Crossed-beam experiment * Hexafluoropropylene oxide
Obor OECD: Physical chemistry
Impakt faktor: 2.997, rok: 2018

We probe the electron attachment in hexafluoropropylene oxide (HFPO), C3F6O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5 × 10−4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20–100 mbar. In the latter method, the cross sections are unfolded from the electron attachment rate coefficients. The cross sections derived independently by the two methods are in very good agreement. We additionally discuss the dissociative electron attachment fragmentation patterns and their role in the radical production in industrial HFPO plasmas.
Trvalý link: http://hdl.handle.net/11104/0289972