Počet záznamů: 1
Improvement of the signal to noise ratio for fluorescent imaging in microfluidic chips
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SYSNO ASEP 0564731 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Improvement of the signal to noise ratio for fluorescent imaging in microfluidic chips Tvůrce(i) Liu, X. (CN)
Zhu, H. (CN)
Sabo, Jan (BTO-N)
Lánský, Zdeněk (BTO-N)
Neuzil, P. (CN)Celkový počet autorů 5 Číslo článku 18911 Zdroj.dok. Scientific Reports. - : Nature Publishing Group - ISSN 2045-2322
Roč. 12, č. 1 (2022)Poč.str. 9 s. Jazyk dok. eng - angličtina Země vyd. DE - Německo Klíč. slova ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY ; SURFACE-ROUGHNESS ; X-RAY-FLUORESCENCE Vědní obor RIV JJ - Ostatní materiály Obor OECD 2.10 Nano-technology CEP LM2018129 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy EF18_046/0016045 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy Způsob publikování Open access Institucionální podpora BTO-N - RVO:86652036 UT WOS 000879914800037 EID SCOPUS 85141545710 DOI 10.1038/s41598-022-23426-z Anotace Microfluidics systems can be fabricated in various ways using original silicon glass systems, with easy Si processing and surface modifications for subsequent applications such as cell seeding and their study. Fluorescent imaging of cells became a standard technique for the investigation of cell behavior. Unfortunately, high sensitivity fluorescent imaging, e.g., using total internal reflection fluorescence (TIRF) microscopy, is problematic in these microfluidic systems because the uneven surfaces of the silicon channels' bottoms affect light penetration through the optical filters. In this work, we study the nature of the phenomenon, finding that the problem can be rectified by using a silicon-on-insulator (SOI) substrate, defining the channel depth by the thickness of the top Si layer, and halting the etching at the buried SiO2 layer. Then the fluorescent background signal drops by = 5 times, corresponding to the limit of detection drop from = 0.05 mM to = 50 nM of fluorescein. We demonstrate the importance of a flat surface using TIRF-based single-molecule detection, improving the signal to a noise ratio more than 18 times compared to a conventional Si wafer. Overall, using very high-quality SOI substrates pays off, as it improves the fluorescence image quality due to the increase in signal-to-noise ratio. Concerning the cost of microfluidic device fabrication-design, mask fabrication, wafer processing, and device testing-the initial SOI wafer cost is marginal, and using it improves the system performance. Pracoviště Biotechnologický ústav Kontakt Monika Kopřivová, Monika.Koprivova@ibt.cas.cz, Tel.: 325 873 700 Rok sběru 2023 Elektronická adresa https://www.nature.com/articles/s41598-022-23426-z
Počet záznamů: 1