Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

MAKHOTKIN, I.A., MILOV, I., CHALUPSKÝ, J., TIEDTKE, K., ENKISCH, H., DE VRIES, G., SCHOLZE, F., SIEWERT, F., STURM, J.M., NIKOLAEV, K. V., VAN DE KRUIJS, R.W.E., SMITHERS, M.A., VAN WOLFEREN, H.A.G.M., KEIM, E.G., LOUIS, E., JACYNA, I., JUREK, M., KLINGER, D., PEŁKA, J.B., JUHA, L., HÁJKOVÁ, V., VOZDA, V., BURIAN, T., SAKSL, K., FAATZ, B., KEITEL, B., PLÖNJES, E., SCHREIBER, S., TOLEIKIS, S., LOCH, R., HERMANN, M., STROBEL, S., DONKER, R., MEY, T., SOBIERAJSKI, R. Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold. Journal of the Optical Society of America. B. 2018, 35(11), 2799-2805. ISSN 0740-3224. E-ISSN 1520-8540. Dostupné z: doi: 10.1364/JOSAB.35.002799.