Počet záznamů: 1
Laser ablation for material processing
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SYSNO ASEP 0556901 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Laser ablation for material processing Tvůrce(i) Cutroneo, Mariapompea (UJF-V) ORCID, RID, SAI
Havránek, Vladimír (UJF-V) RID, SAI, ORCID
Macková, Anna (UJF-V) RID, ORCID, SAI
Malinský, Petr (UJF-V) RID, ORCID, SAI
Silipigni, L. (IT)
Slepička, P. (CZ)
Fajstavr, D. (CZ)
Torrisi, L. (IT)Celkový počet autorů 8 Zdroj.dok. Radiation Effects and Defects in Solids. - : Taylor & Francis - ISSN 1042-0150
Roč. 177, 1-2 (2022), s. 71-84Poč.str. 14 s. Forma vydání Tištěná - P Jazyk dok. eng - angličtina Země vyd. GB - Velká Británie Klíč. slova Backward plasma acceleration ; forward plasma acceleration ; pulsed laser deposition ; laser ablation in medium Obor OECD Nuclear physics Výzkumná infrastruktura CANAM II - 90056 - Ústav jaderné fyziky AV ČR, v. v. i. Způsob publikování Omezený přístup Institucionální podpora UJF-V - RVO:61389005 UT WOS 000771135200001 EID SCOPUS 85126783947 DOI 10.1080/10420150.2022.2049783 Anotace The laser ablation is an established material processing for many applications in nanotechnology, materials science and biomedicine. The laser ablation can be carried out in vacuum, in air and in liquid. Laser ablation mechanisms and their products depend on laser fluence, wavelength, pulse duration, ablation environment as well as target composition, density, thickness, roughness. This contribution is addressed to laser ablation of solid targets with the aim of hot plasma generation and thin film deposition on substrates located in appropriate positions in vacuum and in air. In the first section is presented an example of forward and backward plasma accelerations using the sub-nanosecond laser at the PALS laboratory (Czech Republic) for pulsed laser deposition processing. In the second section is reported the use of a nanosecond laser coupled to a post-accelerating compact system employed at the INFN in Catania (Italy) to ablate germanium solid targets in vacuum and to deposit thin films on SiO2/Si substrates to modify their native features. The last section is focused on the use of the nanosecond laser at the Tandetron laboratory (Czech Republic) employed for pulsed laser deposition and laser-induced backward transfer processing in vacuum and in air. Pracoviště Ústav jaderné fyziky Kontakt Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Rok sběru 2023 Elektronická adresa https://doi.org/10.1080/10420150.2022.2049783
Počet záznamů: 1