Počet záznamů: 1
Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties
- 1.Krýsová, Hana - Neumann-Spallart, M. - Tarábková, Hana - Janda, Pavel - Kavan, Ladislav - Krýsa, J.
Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties.
Beilstein Journal of Nanotechnology. Roč. 12, JAN 2021 (2021), s. 24-34. ISSN 2190-4286. E-ISSN 2190-4286
Obor OECD: Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)
Impakt faktor: 3.272, rok: 2021
Způsob publikování: Open access
http://hdl.handle.net/11104/0316945
Počet záznamů: 1