Improved amorphous/crystalline silicon interface passivation by hydrogen plasma treatment

Descoeudres, A., Barraud, L., De Wolf, S., Strahm, B., Lachenal, D., Guérin, C., Holman, Z.C., Zicarelli, F., Demaurex, B., Seif, J., Holovský, J., Ballif, C. Improved amorphous/crystalline silicon interface passivation by hydrogen plasma treatment. Applied Physics Letters. 2011, 99(12), 123506/1-123506/3. ISSN 0003-6951. E-ISSN 1077-3118. Dostupné z: doi: 10.1063/1.3641899.