Počet záznamů: 1
Nanoscale surface dynamics of RF-magnetron sputtered CrCoCuFeNi high entropy alloy thin films
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SYSNO ASEP 0563270 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Nanoscale surface dynamics of RF-magnetron sputtered CrCoCuFeNi high entropy alloy thin films Tvůrce(i) Oladijo, S. S. (ZA)
Mwema, F. M. (ZA)
Jen, T. C. (ZA)
Ronoh, K. (KE)
Sobola, Dinara (UFM-A) ORCID
Akinlabi, E. T. (GB)Celkový počet autorů 6 Číslo článku 104523 Zdroj.dok. Materials Today Communications. - : Elsevier - ISSN 2352-4928
Roč. 33, DEC (2022)Poč.str. 9 s. Jazyk dok. eng - angličtina Země vyd. NL - Nizozemsko Klíč. slova High entropy alloy thin films ; Fractals ; Surface roughness ; Sputtering ; Fractal dimension ; Lacunarity ; Multifractal Vědní obor RIV JK - Koroze a povrchové úpravy materiálů Obor OECD Coating and films Výzkumná infrastruktura CzechNanoLab - 90110 - Vysoké učení technické v Brně Způsob publikování Omezený přístup Institucionální podpora UFM-A - RVO:68081723 UT WOS 000867516000005 EID SCOPUS 85138478357 DOI 10.1016/j.mtcomm.2022.104523 Anotace High entropy alloy (HEA) thin films of CrCoCuFeNi are grown on stainless steel substrate using radiofrequency (RF) magnetron sputtering method at different sputtering times (30, 60 and 90 min), substrate temperatures (room temperature, 100 and 200 deg. Celsius) and RF powers (100, 150 and 200 W). The nanoscale morphology and topography of the thin films are obtained using an atomic force microscopy (AFM) method. The average surface roughness, interface width, fractal and multifractal characteristics of the films are presented. It is shown that the average surface roughness and interface width decrease with the time of deposition while considering the combination of the other factors. The autocorrelation and height-height correlation functions reveal that these surfaces are self-affine and exhibit fractal characteristics. The increase in sputtering power, with different combinations of time and temperature, is related to large fractal dimension and small lacunarity coefficient. The increase in substrate temperature (for different combinations with time and RF power) is shown to enhance the spatial roughness of the HEA thin films. A multifractal analysis undertaken using generalized fractal dimension, mass exponent against moment order and multifractal spectrum reveal that all the films have a multifractal character, and the films deposited at high temperatures and powers exhibit the strongest multifractal behaviour. Pracoviště Ústav fyziky materiálu Kontakt Yvonna Šrámková, sramkova@ipm.cz, Tel.: 532 290 485 Rok sběru 2023 Elektronická adresa https://www.sciencedirect.com/science/article/pii/S2352492822013642?via%3Dihub
Počet záznamů: 1