Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser

Milov, I.; Makhotkin, I.A.; Sobierajski, R.; Medvedev, Nikita; Lipp, V.; Chalupský, J.; Sturm, J.M.; Tiedtke, K.; de Vries, G.; Stoermer, M.; Siewert, F.; van de Kruijs, R.; Louis, E.; Jacyna, I.; Jurek, M.; Juha, L.; Hájková, V.; Vozda, V.; Burian, T.; Saksl, K.; Faatz, B.; Keitel, B.; Ploenjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Hermann, M.; Strobel, S.; Nienhuys, H.-K.; Gwalt, G.; Mey, T.; Enkisch, H.; Bijkerk, F.

doi:https://dx.doi.org/10.1364/OE.26.019665

Počet záznamů: 1

Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser

1.

SYSNO ASEP	0500161
Druh ASEP	J - Článek v odborném periodiku
Zařazení RIV	J - Článek v odborném periodiku
Poddruh J	Článek ve WOS
Název	Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser
Tvůrce(i)	Milov, I. (NL) Makhotkin, I.A. (NL) Sobierajski, R. (PL) Medvedev, Nikita (UFP-V)_ORCID Lipp, V. (DE) Chalupský, J. (CZ) Sturm, J.M. (NL) Tiedtke, K. (DE) de Vries, G. (NL) Stoermer, M. (DE) Siewert, F. (DE) van de Kruijs, R. (NL) Louis, E. (NL) Jacyna, I. (PL) Jurek, M. (PL) Juha, L. (CZ) Hájková, V. (CZ) Vozda, V. (CZ) Burian, T. (CZ) Saksl, K. (SK) Faatz, B. (DE) Keitel, B. (DE) Ploenjes, E. (DE) Schreiber, S. (DE) Toleikis, S. (DE) Loch, R. (DE) Hermann, M. (DE) Strobel, S. (DE) Nienhuys, H.-K. (NL) Gwalt, G. (DE) Mey, T. (DE) Enkisch, H. (DE) Bijkerk, F. (NL)
Celkový počet autorů	33
Zdroj.dok.	Optics Express. - : Optical Society of America - ISSN 1094-4087 Roč. 26, č. 15 (2018), s. 19665-19685
Poč.str.	21 s.
Jazyk dok.	eng - angličtina
Země vyd.	US - Spojené státy americké
Klíč. slova	molecular-dynamics ; threshold measurements ; multilayer optics ; lattice-dynamics ; metal targets ; pulse ; ablation ; spallation ; radiation ; surface
Vědní obor RIV	BH - Optika, masery a lasery
Obor OECD	Optics (including laser optics and quantum optics)
CEP	EF16_013/0001552 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy
Institucionální podpora	UFP-V - RVO:61389021
UT WOS	000439472400076
EID SCOPUS	85051818917
DOI	10.1364/OE.26.019665
Anotace	Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH. Ex-situ analysis of the damaged spots, performed by different types of microscopy, shows that the weakest detected damage is surface roughening. For higher fluences we observe ablation of Ru. Combined simulations using Monte-Carlo code XCASCADE(3D) and the two-temperature model reveal that the damage mechanism is photomechanical spallation, similar to the case of irradiating the target with optical lasers. The analogy with the optical damage studies enables us to explain the observed damage morphologies.
Pracoviště	Ústav fyziky plazmatu
Kontakt	Vladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975
Rok sběru	2019
Elektronická adresa	https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-15-19665

Počet záznamů: 1