Počet záznamů: 1
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO.sub.2./sub. layers
- 1.Hippler, R., Hubička, Z., Čada, M., Kšírová, P., Wulff, H., Helm, C.A., Straňák, V. Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers. Journal of Applied Physics. 2017, 121(17), 1-9), 171906. ISSN 0021-8979. E-ISSN 1089-7550. Dostupné z: doi: 10.1063/1.4977823
Počet záznamů: 1