Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

0377074 - FZÚ 2013 RIV CH eng J - Článek v odborném periodiku
Straňák, V. - Drache, S. - Bogdanowicz, R. - Wulff, H. - Herrendorf, A.-P. - Hubička, Zdeněk - Čada, Martin - Tichý, M. - Hippler, R.
Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering.
Surface and Coatings Technology. Roč. 206, 11-12 (2012), s. 2801-2809. ISSN 0257-8972
Grant CEP: GA TA ČR TA01010517; GA ČR(CZ) GAP205/11/0386; GA ČR GP202/09/P159; GA ČR GA202/09/0800
Grant ostatní: MŠMT(CZ) CZ.1.05/2.1.00/03.0058
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: dual magnetron * HiPIMS * MF discharge * Ti-Cu films * IVDF * XRD
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 1.941, rok: 2012

The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode–cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at the substrate position about 25–30 μs after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti–Cu films.
Trvalý link: http://hdl.handle.net/11104/0209328