Počet záznamů: 1
LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition
- 1.STUCHLÍK, J., LEDINSKÝ, M., HONDA, S., DRBOHLAV, I., MATES, T., FEJFAR, A., HRUŠKA, K., STUCHLÍKOVÁ, T.-H., KOČKA, J. LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition. Thin Solid Films. 2009, 517(24), 6829-6832. ISSN 0040-6090. E-ISSN 1879-2731. Dostupné z: doi: 10.1016/j.tsf.2009.05.022
Počet záznamů: 1