NAKAHATA, K., KAMIYA, T., FORTMANN, C. M., SHIMIZU, I., STUCHLÍKOVÁ, Hana, FEJFAR, Antonín, KOČKA, Jan. Anisotropic carrier transport in preferentially oriented polycrystalline silicon films fabricated by very-high-frequency plasma enhanced chemical vapor deposition using fluorinated source gas. Journal of Non-Crystalline Solids. 2000, 266-269(-), 341-346. ISSN 0022-3093. E-ISSN 1873-4812.