Deposition and forming of nanoparticles on the hydrogenated silicon thin films

0483632 - FZÚ 2018 RIV FR eng A - Abstrakt
Stuchlík, Jiří - Fajgar, Radek - Kupčík, Jaroslav - Stuchlíková, The-Ha - Ledinský, Martin - Čermák, Jan - Píč, Vlastimil - Remeš, Zdeněk - Mortet, Vincent - Shklyaev, A.A. - Volodin, V.
Deposition and forming of nanoparticles on the hydrogenated silicon thin films.
E-MRS 2017 Spring Meeting and Exhibit. Strasbourg: European Materials Research Society, 2017.
[E-MRS 2017 Spring Meeting and Exhibit. 22.05.2017-26.05.2017, Strasbourg]
Grant CEP: GA ČR GC16-10429J; GA MŠMT LM2015087; GA ČR GA13-31783S
Grant ostatní: AV ČR(CZ) KONNECT-007
Program: Bilaterální spolupráce
Institucionální podpora: RVO:68378271 ; RVO:67985858
Klíčová slova: nanoparticles * hydrogen * silicon
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.); Physical chemistry (UCHP-M)

Thin films prepared by deposition of nanoparticles on the surface of hydrogenated silicon were studied for optoelectronic applications. Three techniques were used to prepare the nanoparticles – high vacuum evaporation resp. MBE and ArF laser ablation. Broad range of deposition conditions (e.g. precursor pressure, temperature and laser fluence) was studied. Interesting and utilizable optoelectronic properties were observed at multilayered films composed of different nanoparticles. Research was focused on preparation of magnesium silicide, calcium silicide, germanium and tin nanoparticles. The nanoparticles were deposited immediately after deposition of the hydrogenated silicon layer by plasma enhanced CVD without exposing the underlying layer to ambient air. The deposited material was characterized by means of Raman and photoelectron spectroscopy techniques. Transmission, scanning and atomic force microscopies were used for more detailed description of the prepared layers.
Trvalý link: http://hdl.handle.net/11104/0278850