Direct measurements of the ion flux at the substrate in reactive HiPIMS

0464208 - FZÚ 2017 RIV DE eng A - Abstrakt
Čada, Martin - Lundin, D. - Hubička, Zdeněk
Direct measurements of the ion flux at the substrate in reactive HiPIMS.
International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. Braunschweig: European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016. s. 415-415.
[International Conference on Plasma Surface Engineering ( PSE 2016 ). 12.09.2016-16.09.2016, Garmisch-Partenkirchen]
Grant CEP: GA ČR(CZ) GA15-00863S; GA TA ČR TA03010743
GRANT EU: European Commission(XE) 608800 - HIPPOCAMP
Institucionální podpora: RVO:68378271
Klíčová slova: HiPIMS * impedance * ion flux * reactive sputtering
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech

A direct measurement of the ion flux impinging on the substrate during ionized physical vapour deposition is valuable input when optimizing thin film deposition processes such as High-Power Impulse magnetron sputtering. However, these measurements are often complicated by the fact that they require expensive diagnostic equipment. For that reason an innovative approach consisting of an extension of a quartz crystal microbalance (QCM) sensor has been investigated in the present contribution. On top of deposition rate, the modified QCM is able to measure ionized fraction of depositing particles and ion flux on the substrate. Recently reported results proved that magnets placed at the top of the QCM sensor are able to significantly reduce electron current on the positively biased electrode attached to the crystal and in this way measure only the deposition rate of neutral particles.
Trvalý link: http://hdl.handle.net/11104/0263191