Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis

0567910 - FZÚ 2023 RIV CH eng J - Článek v odborném periodiku
Domonkos, M. - Kromka, Alexander
Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis.
Symmetry-Basel. Roč. 14, č. 12 (2022), č. článku 2642. E-ISSN 2073-8994
Grant CEP: GA MŠMT LM2018110
Institucionální podpora: RVO:68378271
Klíčová slova: nanosphere lithography * self-assembly * hexagonal symmetry * plasma etching * image analysis * defect detection
Obor OECD: Nano-materials (production and properties)
Impakt faktor: 2.7, rok: 2022
Způsob publikování: Open access

This paper reviews technological challenges in NSL mask preparation, its modification, and quality control. Spin coating with various process parameters (substrate wettability, solution properties, spin coating operating parameters) are discussed to create a uniform monolayer from monodisperse polystyrene (PS) nanospheres with a diameter of 0.2–1.5 um. The prepared highly ordered nanopatterned arrays (from circular, triangular, pillar-shaped structures) are applicable in many different fields (plasmonics, photonics, sensorics, biomimetic surfaces, life science, etc.).

Trvalý link: https://hdl.handle.net/11104/0339173