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Determination of Composition and Thickness of MnSi and MnGe Layers by EDS.
- 1.0541357 - ÚCHP 2022 RIV US eng J - Článek v odborném periodiku
Koštejn, Martin - Fajgar, Radek - Dřínek, Vladislav - Jandová, Věra - Novotný, F.
Determination of Composition and Thickness of MnSi and MnGe Layers by EDS.
Journal of Nondestructive Evaluation. Roč. 39, č. 2 (2020), č. článku 40. ISSN 0195-9298. E-ISSN 1573-4862
Grant CEP: GA ČR(CZ) GA18-15613S
Grant ostatní: AV ČR(CZ) StrategieAV21/3
Program: StrategieAV
Institucionální podpora: RVO:67985858
Klíčová slova: composition * area density * thickness
Obor OECD: Physical chemistry
Impakt faktor: 1.995, rok: 2020
Způsob publikování: Open access s časovým embargem
Determination of composition and thickness is crucial for the preparation of thin layers. A separate measurement is possible, however, it could be time-consuming, and each technique requires a specifically prepared sample. Therefore, a combined, fast, and reliable technique would be advantageous. Calibration of energy dispersive X-ray spectroscopy (EDS) integrated with scanning electron microscope (SEM) by X-ray photoelectron spectroscopy (XPS), weighting balance and atomic force microscopy (AFM) were performed for simultaneous and non-destructive concentration, area density and thickness measurements of MnSi and MnGe thin layers prepared by a reactive pulsed laser deposition (PLD). The linearity of calibrations was supported by Monte Carlo calculations. The calibrations enabled the evaluation of Mn concentration with a deviation better than 2.7 at.%. The area density was determined with a deviation better than 6.8 µg/cm2, and the thickness was determined with a deviation better than 4.1 nm for samples measured with a standard substrate. The thickness measurement calibration omitting the standard substrate measurement resulted in the higher deviation of 7.6 nm, however, it enabled double sample throughput and spatial analyses.
Trvalý link: http://hdl.handle.net/11104/0318917
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