The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor

0541267 - ÚFP 2022 RIV JP eng J - Článek v odborném periodiku
Wandell, R. J. - Bresch, D. - Wang, H. - Babický, Václav - Lukeš, Petr - Locke, B. R.
The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor.
International Journal of Plasma Environmental Science and Technology. Roč. 14, č. 1 (2020), s. 1-9, č. článku e01008. ISSN 1881-8692
Grant CEP: GA ČR(CZ) GA19-25026S; GA MŠMT(CZ) EF16_027/0008354
Institucionální podpora: RVO:61389021
Klíčová slova: Filamentary discharge * Hydrogen peroxide * Nanosecond discharge * Non-thermal plasma * Pulse frequency * Wet plasma
Obor OECD: Fluids and plasma physics (including surface physics)
Způsob publikování: Omezený přístup
http://ijpest.com/Contents/14/1/e01008.html

The influence of pulse frequency (1−60 kHz) in a nanosecond filamentary discharge propagating along a flowing liquid water film was assessed with regards to the formation of chemical species with argon and helium carrier gasses. The production rate and energy yield for H2O2 and H2 were measured for both carrier gases, and O2 formation was determined for helium. The effect of pulse frequency on the energy dissipated per pulse as well as electron density was also investigated. The results indicate that the energy yield for H2O2 decreases with increasing pulse frequency while the energy yields of H2 and O2 remain relatively unaffected. It is proposed that the difference in the trends of the liquid versus gas phase products can be attributed to the significantly longer residence time of the liquid phase allowing for more degradation of formed hydrogen peroxide before it is able exit the reactor.
Trvalý link: http://hdl.handle.net/11104/0318855