Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning

0437840 - ÚPT 2015 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Meluzín, Petr - Horáček, Miroslav - Urbánek, Michal - Bok, Jan - Krátký, Stanislav - Matějka, Milan - Chlumská, Jana - Kolařík, Vladimír
Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014. ISBN 978-80-87294-55-0.
[NANOCON 2014. International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
Grant CEP: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institucionální podpora: RVO:68081731
Klíčová slova: e-beam writer * optical nano structures * diffraction gratings * fractal gratings
Kód oboru RIV: BH - Optika, masery a lasery

E-beam lithography is a flexible technology for diffraction gratings origination. Nevertheless, requirements of the high optical quality of large area diffractive structures imply various severe challenges to e-beam delineating processes. This paper summarizes the e-beam process parameters that influence the quality of large area grating structures. Next, we propose some new methods to prepare diffraction gratings that were found to be useful for testing and benchmarking purposes. Those methods include single line gratings, labyrinth structures, fractional structures, tiling patterns, quasi regular filling structures and forked line structures. Various samples were prepared with the standard and newly developed e-beam patterning processes using both e-beam writers available: one with the Gaussian beam at 100 keV and another one with the shaped beam at 15 keV. Some of the results are presented further in this paper, their variants and parameters are discussed as well as their usefulness as benchmarking e-beam patterns for large area optical structures, elements and devices.
Trvalý link: http://hdl.handle.net/11104/0241326