Počet záznamů: 1
Investigation of the RF plasma jet system for deposition of LiCoO.sub.x./sub. thin films
- 1.0134426 - FZU-D 20030326 RIV NL eng J - Článek v odborném periodiku
Hubička, Zdeněk - Čada, Martin - Jakubec, Ivo - Bludská, Jana - Málková, Zuzana - Trunda, Bohumil - Ptáček, Pavel - Přidal, Jiří - Jastrabík, Lubomír
Investigation of the RF plasma jet system for deposition of LiCoOx thin films.
Surface and Coatings Technology. 174-175, - (2003), s. 632-637. ISSN 0257-8972
Grant CEP: GA ČR GP202/02/P021; GA MŠMT LN00A015
Grant ostatní: NATO(XX) SfP972523
Výzkumný záměr: CEZ:AV0Z4032918; CEZ:AV0Z1010921
Klíčová slova: plasma jet * LiCoO2 thin films * Langmuir probe
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 1.410, rok: 2003
The RF plasma jet system was investigated as a source for the sputtered deposition of LiCoOx thin films. Plasma jet parameters were investigated during the sputtering process by a Langmuir probe system in the position of the substrate. The electron energy distribution function(EEDF) derivated from the Maxwellian distribution mainly in the energetic range below 5 eV.
Trvalý link: http://hdl.handle.net/11104/0032329
Počet záznamů: 1