0134270 - FZU-D 20030166 RIV NL eng J - Článek v odborném periodiku
Mišina, Martin
Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films.
Surface and Coatings Technology. 169-170, - (2003), s. 53-56. ISSN 0257-8972.
[Frontiers of Surface Engineering. Nagoya, 28.10.2001-31.10.2001]
Grant CEP: GA MŠMT ME 455; GA ČR GA106/99/D086
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: magnetron * reactive sputtering * titanium carbide * metan * argon
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.410, rok: 2003

In the present paper the investigation of the energy and composition of the positive and negative ion flux towards a substrate during reactive magnetron sputter-deposition of Ti-C:H films is reported.The energy distributions, mass spectra fluxes of the positive and negative ions were measured for various compositions and total pressure of the working mixture.
Trvalý link: http://hdl.handle.net/11104/0032184