0134203 - FZU-D 20030096 RIV NL eng J - Článek v odborném periodiku
Fulem, M. - Růžička, K. - Růžička, V. - Hulicius, Eduard - Šimeček, Tomislav - Melichar, Karel - Pangrác, Jiří - Rushworth, S. A. - Smith, L. M.
Vapor pressure of metal organic precursors.
Journal of Crystal Growth. Roč. 248, - (2003), s. 99-107. ISSN 0022-0248. E-ISSN 1873-5002
Grant CEP: GA ČR GA102/99/0414
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: organometallic precursors * static method * vapor pressure
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.414, rok: 2003

The vapour pressure of four metal organic precursors, diethylzinc, triethylantimony, trimethygallium and trimethylaluminium used in the metal organic vapor phase processes was measured by a state method in the technologically important temperature range. The experimental data were fitted by the Antoine equation.
Trvalý link: http://hdl.handle.net/11104/0032119