0133550 - FZU-D 20010245 RIV NL eng J - Článek v odborném periodiku
Mišina, Martin - Shaginyan, L. R. - Maček, M. - Panjan, P.
Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering.
Surface and Coatings Technology. 142-144, - (2001), s. 348-354. ISSN 0257-8972.
[International Conference on Plasma Surface Engineering /7./. Garmisch-Partenkirchen, 17.09.2000-21.09.2000]
Grant CEP: GA ČR GV106/96/K245; GA ČR GA106/99/D086
Výzkumný záměr: CEZ:A02/98:Z1-010-914
Klíčová slova: DC * magnetron * reactive sputtering * titanium nitride * tungsten * energy resolved mass spectroscopy
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.236, rok: 2001

The energy distribution and composition of the ion flux on a substrate during ractive magnetron sputtering of TiN and TiWN films were studied by the energy resolved mass spectroscopy. The sputtering was carried out in a mixture of argon and nitrogen of various compositions at pressures from 0.05 Pa to 10 Pa and discharge currents from 0.5A to 7A.
Trvalý link: http://hdl.handle.net/11104/0031513