0132072 - FZU-D 980319 RIV JP eng J - Článek v odborném periodiku
Shoyama, H. - Mišina, Martin - Miyake, S.
Characteristics of an ECR plasma sputtering source at low Ar/N2 gas pressures for thin film synthesis.
Japanese Journal of Applied Physics. Roč. 36, 7B (1997), s. 4583-4587. ISSN 0021-4922. E-ISSN 1347-4065
Impakt faktor: 1.261, rok: 1997
Trvalý link: http://hdl.handle.net/11104/0030110