0023758 - ÚACH 2006 RIV GB eng J - Článek v odborném periodiku
Buršík, Josef - Železný, Vladimír - Vaněk, Přemysl
Preparation of potassium tantalate niobate thin films by chemical solution deposition and their characterization.
[Příprava KNbTaO3 tenkého filmu metodou depozice z kapalné fáze a jeho charakterizace.]
Journal of the European Ceramic Society. Roč. 25, č. 12 (2005), s. 2151-2154. ISSN 0955-2219. E-ISSN 1873-619X
Grant CEP: GA ČR GA202/02/0238; GA MŠMT(CZ) LN00A028; GA MŠMT OC 528.001
Výzkumný záměr: CEZ:AV0Z40320502
Klíčová slova: films * tantalates * chemical solution deposition
Kód oboru RIV: CA - Anorganická chemie
Impakt faktor: 1.567, rok: 2005

Potassium tantalate niobate (KTaxNb1-xO3, (KTN), where x=0, 0.21, 0.36, 0.53, 0.74, 0.82, 0.86, and 1) thin films of perovskite structure were prepared by chemical solution deposition (CSD) on Si and SiO2 glass substrates. A homogeneous and stable precursor solution was obtained by dissolving potassium, niobium and tantalum isobutoxides in absolute isobutanol and an addition of diethanolamine as a modifier. The film quality was determined by annealing temperature and heating regime, Al2O3 "chemical" buffer layer and KNbO3 seeding layer. Optimum conditions for film preparation were found. It was approved by X-ray diffraction (XRD) that the films have the wanted pseudocubic perovskite structure. Infrared transmittance was measured for broad range of Ta/Nb ratios. The spectra show continuous transformation from KTaO3 to KNbO3 and indicate that the optical axis lies in the plane of the film.

Tantaličnan-niobičnan draselný ( KTN ), kde x=O,......, ve formě tenké vrstvy s perovskitovou strukturou byl připraven metodou depozice z kapalné fáze ( CSD ) na Si a SiO2 podložkách.
Trvalý link: http://hdl.handle.net/11104/0114412