Growth and properties of full Heusler Co.sub.2./sub.TiSn epitaxial thin films

0587319 - FZÚ 2025 RIV NL eng J - Článek v odborném periodiku
Shamardin, Artem - Cichoň, Stanislav - Rameš, Michal - de Prado, Esther - Volfová, Lenka - Kmječ, Tomáš - Fekete, Ladislav - Kopeček, Jaromír - Kos, P. - Nowak, L. - Heicl, J. - Zázvorka, J. - Hamrle, J. - Veis, M. - Heczko, Oleg - Lančok, Ján
Growth and properties of full Heusler Co₂TiSn epitaxial thin films.
Journal of Alloys and Compounds. Roč. 1002, Oct (2024), č. článku 175296. ISSN 0925-8388. E-ISSN 1873-4669
Grant CEP: GA MŠMT(CZ) EH22_008/0004591; GA ČR(CZ) GA24-11361S; GA MŠMT LM2023065
Institucionální podpora: RVO:68378271
Klíčová slova: Heusler alloys * thin film * epitaxy * ferromagnetism * Kerr effect * DFT
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 6.2, rok: 2022
Způsob publikování: Open access

Full Heusler Co2TiSn thin film were grown by DC magnetron sputtering on MgO(001) substrates at temperatures from ambient up to 800°C. The state of films was investigated by wide range of techniques including atomic force and electron microscopy, X-ray diffraction and photoelectron spectroscopy, magnetometry, and magnetooptical ellipsometry supported by ab initio calculation.
Trvalý link: https://hdl.handle.net/11104/0354559